1. COMPETITIVE PRICE
2. ELIGIBLE
3. ABUNDANT
4. CONTINUABLE...
1. COMPETITIVE PRICE
2. ELIGIBLE
3. ABUNDANT
4. CONTINUABLE
General Characteristics
Product
Multicrystalline silicon wafer
Growth Method
Directional solidification
Conductivity Type
P type
Dopant
Boron
Resistivity
1~3Ω.cm
Oxygen Content
1×10
18
atom/cm
3
Carbon Content
4×10
17
atom/cm
3
Structural Characteristics
Side
156.0mm ± 0.5mm
Corner diagonal
1.5mm ± 0.5mm
Corner Angle
45°±10°
Thickness
180±20μm; 200±20μm
Surface
No stain or splash on surface
Mechanical Characteristics
TTV
≤40μm
Bow
≤70μm
Surface
No defect
Saw Mark
≤15μm
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